Abstract <p>Ga<sub>2</sub>O<sub>3</sub> polycrystalline thin films were deposited by spray pyrolysis method. The films were post-annealed at 700, 900, and 1100°C for 2 h, then the crystal structure, surface morphology and optical properties of the films were studied. As the post-annealing temperature increases, the average crystallite size of the film increased from approximately 6 to 21 nm, and the FWHM of rocking curve for the (400) plane of the β‑Ga<sub>2</sub>O<sub>3</sub> decreased from 1.29° to 0.38°. The increase of post-annealing temperature controls phase formation in the films. When post-annealed at 700°C, the Ga<sub>2</sub>O<sub>3</sub> film is not completely transformed into β phase. While post-annealed at temperatures ≥900°C, the Ga<sub>2</sub>O<sub>3</sub> in the films is all β-Ga<sub>2</sub>O<sub>3</sub>. Additionally, the increase in post-annealing temperature induced changes in the micro-strains of Ga<sub>2</sub>O<sub>3</sub> films, which resulted in a reduction of the bandgap. These findings highlight the critical role of post-annealing temperature in controlling the structural and optical properties of Ga<sub>2</sub>O<sub>3</sub> thin films, making it a key parameter for improving the quality of β-Ga<sub>2</sub>O<sub>3</sub> films.</p>

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Effects of Post-Annealing Temperature on the Properties of β-Ga2O3 Thin Films Prepared by Spray Pyrolysis

  • X. Zhang,
  • D. I. Panov,
  • V. A. Spiridonov,
  • N. K. Kuzmenko,
  • N. D. Prasolov,
  • A. Yu. Ivanov,
  • M. V. Dorogov,
  • D. A. Bauman,
  • A. E. Romanov

摘要

Abstract

Ga2O3 polycrystalline thin films were deposited by spray pyrolysis method. The films were post-annealed at 700, 900, and 1100°C for 2 h, then the crystal structure, surface morphology and optical properties of the films were studied. As the post-annealing temperature increases, the average crystallite size of the film increased from approximately 6 to 21 nm, and the FWHM of rocking curve for the (400) plane of the β‑Ga2O3 decreased from 1.29° to 0.38°. The increase of post-annealing temperature controls phase formation in the films. When post-annealed at 700°C, the Ga2O3 film is not completely transformed into β phase. While post-annealed at temperatures ≥900°C, the Ga2O3 in the films is all β-Ga2O3. Additionally, the increase in post-annealing temperature induced changes in the micro-strains of Ga2O3 films, which resulted in a reduction of the bandgap. These findings highlight the critical role of post-annealing temperature in controlling the structural and optical properties of Ga2O3 thin films, making it a key parameter for improving the quality of β-Ga2O3 films.