An in-depth Analysis of the Physical Characteristics of TiO₂–CuO Films Fabricated via Spray Pyrolysis

A composite film of TiO₂–CuO synthesized by spray pyrolysis is deposited onto a silicon (Si) substrate and subjected to comprehensive characterization using diverse analytical techniques. X-ray diffraction (XRD) revealed the presence of an anatase phase of TiO₂ and a monoclinic phase of CuO, with the highest diffraction occurring on the (101) plane. Raman spectra also depict anatase phase of TiO₂. The scanning electron microscope (SEM) image reveals a porous and rough morphology whereas EDX depicts the inclusion of CuO. While UV–Visible diffused reflectance indicates a direct band gap of 3.21 eV. Similarly, photoluminescence (PL) studies reveal a significant reduction in intensity within the UV and blue regions as compared to the yellow region. Likewise, the ideality factor (n) and barrier height (Φ_b), which are diode parameters are computed based on the I–V characteristics. These findings suggest that the TiO₂–CuO film holds potential for applications in the manufacturing of optoelectronic devices.