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Abstract <p>The paper explores the potential of plasma focus facilities for developing a test setup for X-ray optic elements for extreme ultraviolet lithography. It is shown that the ISPF-M facility, using a hydrogen-xenon mixture as the working gas, provides a pulsed source of extreme ultraviolet radiation with a peak intensity in the region of ≈11 nm, and the integrated radiation output in the range of 10–12 nm per pulse can reach ≥10 J.</p>

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Studies of Ultraviolet Radiation from Hydrogen-Xenon Plasma at the Plasma Focus Facility

  • 期刊论文

  • 发表日期：

    2026年8月2日

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  • V. I. Krauz,
  • A. N. Gritsuk,
  • V. V. Myalton,
  • A. M. Kharrasov,
  • Yu. V. Vinogradova

摘要

Abstract

The paper explores the potential of plasma focus facilities for developing a test setup for X-ray optic elements for extreme ultraviolet lithography. It is shown that the ISPF-M facility, using a hydrogen-xenon mixture as the working gas, provides a pulsed source of extreme ultraviolet radiation with a peak intensity in the region of ≈11 nm, and the integrated radiation output in the range of 10–12 nm per pulse can reach ≥10 J.