Methods and Results of Electrochemical Investigation of the Relief of Films Deposited by Magnetron Sputtering
摘要
Abstract
Sputtering modes strongly affect the properties of the deposited films, which are important not only in thermonuclear installations but also in numerous applications. A method is proposed for comparing the development of the relief of coatings deposited in different modes by measuring the characteristics of a double electric layer in an electrochemical cell, taking into account nonlinear effects. The influence of magnetron sputtering and deposition parameters (gas pressure, thickness, presence of a diaphragm that hinders pumping) on the relief of the coating is under investigation. The following parameters were measured: capacitance and impedance of the double electric layer, energy transfer efficiency, specific surface area.