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Abstract <p>This paper presents the results of an analysis of factors affecting on the quality of magnetron sputtering processes using stoichiometric MoS<sub>2</sub> targets. Process factors influencing on the MoS<sub>2</sub> thin film stoichiometry and its reproducibility across different processes have been identified. To achieve a Mo : S stoichiometric ratio closest to the 1 : 2 proportion, it is necessary to eliminate or significantly minimize the formation of sulfur compounds during the target sputtering process, as their formation indicates the occurrence of reactions involving water sorbed inside the system. The research results enable MoS<sub>2</sub> coatings deposition regimes intensification and improve their quality, based on the proposed system for monitoring process parameters.</p>

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Reproducibility and Quality of Magnetron Deposition Processes for MoS2 Thin Films

  • 期刊论文

  • 发表日期：

    2025年12月1日

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  • M. A. Sharapkov,
  • A. I. Belikov,
  • N. M. Sinyavin

摘要

Abstract

This paper presents the results of an analysis of factors affecting on the quality of magnetron sputtering processes using stoichiometric MoS2 targets. Process factors influencing on the MoS2 thin film stoichiometry and its reproducibility across different processes have been identified. To achieve a Mo : S stoichiometric ratio closest to the 1 : 2 proportion, it is necessary to eliminate or significantly minimize the formation of sulfur compounds during the target sputtering process, as their formation indicates the occurrence of reactions involving water sorbed inside the system. The research results enable MoS2 coatings deposition regimes intensification and improve their quality, based on the proposed system for monitoring process parameters.