Scholarlink

Abstract <p>The issues of creating resists in Russia for electron-beam and ion-beam lithography processes are considered. The manufactured positive resists based on polymethyl methacrylate allow the creation of nanosized structures. Moreover, the possibility of using a combination of the created resists as two-layer resists is demonstrated. The prospects for the development of domestic processes of electron-beam and ion-beam lithography are also demonstrated. At present, technological processes of electron-beam and ion-beam lithography in Russia are at the demonstrator stage. In the near future, domestic installations for electron-beam and ion-beam lithography will be developed. It will take significantly more time to organize the production of ion-beam lithography installations in Russia.</p>

错误：搜索内容不能为空，请输入英文关键词
错误：关键词超出字数限制，请精简
高级检索

Prospects for the Development of Electron-Beam and Ion-Beam Lithography in Russia

  • 期刊论文

  • 发表日期：

    2025年8月1日

查看全文
  • S. I. Zaitsev,
  • D. V. Irzhak,
  • A. I. Il’yin,
  • M. A. Knyazev,
  • D. V. Roshchupkin,
  • V. P. Grachev,
  • V. G. Kurbatov,
  • G. V. Malkov

摘要

Abstract

The issues of creating resists in Russia for electron-beam and ion-beam lithography processes are considered. The manufactured positive resists based on polymethyl methacrylate allow the creation of nanosized structures. Moreover, the possibility of using a combination of the created resists as two-layer resists is demonstrated. The prospects for the development of domestic processes of electron-beam and ion-beam lithography are also demonstrated. At present, technological processes of electron-beam and ion-beam lithography in Russia are at the demonstrator stage. In the near future, domestic installations for electron-beam and ion-beam lithography will be developed. It will take significantly more time to organize the production of ion-beam lithography installations in Russia.