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Abstract <p>The technology of self-assembly of three-dimensional (3D) cubic-shaped mesostructures is presented, based on ion-plasma irradiation on predefined local areas of flat preforms formed from Cr and Cr/SiO<sub>2</sub> films. The driving force of self-assembly is the stress gradient generated in chromium by ion bombardment in the plasma of an Ar RF inductive discharge. The workpiece is folded into a three-dimensional structure when the elements of the workpiece are released as a result of etching off the underlying silicon.</p>

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Self-Assembly of Three-Dimensional Mesostructures Using Local Ion-Plasma Treatment

  • 期刊论文

  • 发表日期：

    2025年6月1日

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  • A. S. Babushkin,
  • R. V. Selyukov,
  • I. I. Amirov,
  • V. V. Naumov,
  • M. O. Izyumov

摘要

Abstract

The technology of self-assembly of three-dimensional (3D) cubic-shaped mesostructures is presented, based on ion-plasma irradiation on predefined local areas of flat preforms formed from Cr and Cr/SiO2 films. The driving force of self-assembly is the stress gradient generated in chromium by ion bombardment in the plasma of an Ar RF inductive discharge. The workpiece is folded into a three-dimensional structure when the elements of the workpiece are released as a result of etching off the underlying silicon.