Scholarlink

Abstract <p>The parameters of halogen-containing inductively coupled plasma of CF<sub>4</sub>, CF<sub>3</sub>Br, and C<sub>2</sub>F<sub>4</sub>Br<sub>2</sub> gases were investigated with the main focus on the study of optical emission spectra of plasma. The results of actinometry showed that concentration of Br is less than concentration of F in both CF<sub>3</sub>Br and C<sub>2</sub>F<sub>4</sub>Br<sub>2</sub> plasma in 5–20 mTorr pressure range in ICP reactor. Accurate approximation of molecular spectra showed significant emission of C, CF, CF<sub>2</sub> and C<sub>2</sub> particles. These facts can mean higher degree of dissociation in ICP reactor than in CCP reactor studied before.</p>

错误：搜索内容不能为空，请输入英文关键词
错误：关键词超出字数限制，请精简
高级检索

Spectroscopy and Actinometry of Halogen-Containing Inductively Coupled Plasma for Anisotropic Etching

  • 期刊论文

  • 发表日期：

    2025年4月1日

查看全文
  • V. O. Kuzmenko

摘要

Abstract

The parameters of halogen-containing inductively coupled plasma of CF4, CF3Br, and C2F4Br2 gases were investigated with the main focus on the study of optical emission spectra of plasma. The results of actinometry showed that concentration of Br is less than concentration of F in both CF3Br and C2F4Br2 plasma in 5–20 mTorr pressure range in ICP reactor. Accurate approximation of molecular spectra showed significant emission of C, CF, CF2 and C2 particles. These facts can mean higher degree of dissociation in ICP reactor than in CCP reactor studied before.