Abstract <p>This paper describes the modeling of electron beam scattering in polymethyl methacrylate (PMMA) and silicon (Si) by the Monte Carlo method using different scattering models. For each substance, three different combinations of elastic and inelastic scattering models from among the most common ones are used in the simulation, both with and without taking into account the generation of secondary electrons. As a result of the modeling, the distributions of absorbed energy and the distributions of scattering events along the coordinate are obtained, whose analysis made it possible to identify the characteristic features of various scattering models.</p>