Parameters and Composition of Plasma in a CF₄ + H₂ + Ar Mixture: Effect of CF₄/H₂ Ratio

The electrophysical parameters of the plasma and the kinetics of plasma-chemical processes in a CF₄ + H₂ + Ar mixture while varying the CF₄/H₂ ratio are studied. When using diagnostic methods and plasma modeling together, it is found that replacing tetrafluoromethane with hydrogen (a) leads to a decrease in the plasma density and an increase in electronegativity; and (b) it causes a disproportionately sharp drop in the concentration of fluorine atoms. The reason for the latter effect is the increase in the frequency of the death of atoms in reactions of the CHF_x + F → CF_x + HF type initiated by heterogeneous recombination via the CF_x + H → CHF_x mechanism. The simultaneous increase in the concentration of polymer-forming CH_xF_y (x + y < 3) radicals indicates an increase in the polymerization load of the plasma on the surfaces in contact with it.