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Abstract <p>Experiments were performed to study the effect of low-temperature argon plasma on chitosan-based organic films. The plasma is created independently by two sources based on radio-frequency and microwave discharges. The generation of plasma flows and their transportation to the region of interaction with the samples are considered, and the results of experiments on the effect on the films are presented.</p>

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Resonant RF and Microwave Discharge in Argon for Plasma Treatment of Chitosan Films

  • 期刊论文

  • 发表日期：

    2026年4月1日

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  • V. V. Andreev,
  • A. V. Artemyev,
  • I. A. Barykov,
  • E. I. Grudiev,
  • S. A. Dvinin,
  • A. R. Egorov,
  • A. V. Kalashnikov,
  • A. S. Kritchenkov,
  • O. M. Khubiev,
  • D. V. Chuprov

摘要

Abstract

Experiments were performed to study the effect of low-temperature argon plasma on chitosan-based organic films. The plasma is created independently by two sources based on radio-frequency and microwave discharges. The generation of plasma flows and their transportation to the region of interaction with the samples are considered, and the results of experiments on the effect on the films are presented.