The Minimization of Secondary Processes, Including Ion Sputtering, in a Miniature Linear Accelerator
摘要
Abstract
The results of numerical modeling of the dynamics of a charged particle beam in the electrode system of a miniature linear accelerator are presented, considering secondary processes. The possibility of minimizing the negative effects associated with secondary processes, such as electrode sputtering and secondary electron emission, was estimated. The calculations were performed at various combinations of the operating pressure and accelerating voltage in the pressure range of 2–8 mTorr and accelerating voltages of 60–100 kV.