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Abstract <p>The cobalt films deposited using the magnetron method on an amorphous Al<sub>2</sub>O<sub>3</sub> layer have been studied. The morphological and magnetic features determined by the formation of a naturally oxidized antiferromagnetic film on cobalt and the Al<sub>2</sub>O<sub>3</sub>/Co interface have been studied. A change in the sign of the exchange bias at temperatures below 200 K has been detected when the cobalt layer thickness on the Al<sub>2</sub>O<sub>3</sub> film is more than 10 nm.</p>

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The Effect of an Al2O3 Layer on the Structural and Temperature-Dependent Magnetic Characteristics of Thin Cobalt Films

  • 期刊论文

  • 发表日期：

    2025年4月1日

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  • A. V. Kobyakov,
  • G. S. Patrin,
  • V. I. Yushkov

摘要

Abstract

The cobalt films deposited using the magnetron method on an amorphous Al2O3 layer have been studied. The morphological and magnetic features determined by the formation of a naturally oxidized antiferromagnetic film on cobalt and the Al2O3/Co interface have been studied. A change in the sign of the exchange bias at temperatures below 200 K has been detected when the cobalt layer thickness on the Al2O3 film is more than 10 nm.