Measurement of Discharge and Plasma Parameters in a Vacuum (Gasless) Magnetron Sputtering System
摘要
Abstract
We presented results of an experimental study of a continuous magnetron discharge in vacuum (gasless) mode with a flat target. The base pressure in the vacuum chamber during the discharge operation was 3 × 10–5 Torr at a magnetron current of 10 A. We developed techniques for measuring the mass-to-charge composition of plasma ions and the electron temperature under conditions of intense target sputtering. Measurement of target temperature was carried out. We developed techniques for comparison of ion current density and degree of ionization of the target material near the substrate in gas and vacuum modes.