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Abstract <p>In the case of a mismatch between the coefficients of thermal expansion of the thin film material and the substrate, the film experiences either compression or tension in the plane of the film-substrate interface. However, for bismuth films produced by thermal vacuum deposition, the deformation corresponding to compression in the film is significantly lower than the calculated value based on the difference in thermal expansion coefficients. To investigate the reasons for this discrepancy, the study of electron backscatter diffraction was carried out on bismuth films subjected to varying mechanical deformations in the film plane, grown on different dielectric substrates. A correlation was found between the degree of misorientation of the trigonal axis in the crystallites of textured block films and the thermal expansion coefficient of the substrate.</p>

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Misorientation of Crystallographic Axes of Crystallites in Bismuth Films on Substrates with Different Temperature Expansion

  • 期刊论文

  • 发表日期：

    2025年12月1日

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  • V. M. Grabov,
  • V. A. Komarov,
  • M. V. Starytsyn,
  • A. V. Rodionov,
  • A. A. Zaytsev,
  • A. V. Suslov

摘要

Abstract

In the case of a mismatch between the coefficients of thermal expansion of the thin film material and the substrate, the film experiences either compression or tension in the plane of the film-substrate interface. However, for bismuth films produced by thermal vacuum deposition, the deformation corresponding to compression in the film is significantly lower than the calculated value based on the difference in thermal expansion coefficients. To investigate the reasons for this discrepancy, the study of electron backscatter diffraction was carried out on bismuth films subjected to varying mechanical deformations in the film plane, grown on different dielectric substrates. A correlation was found between the degree of misorientation of the trigonal axis in the crystallites of textured block films and the thermal expansion coefficient of the substrate.