Features of High-Intensity Implantation of Chromium into Zr1%Nb Alloy Using a High-Power Density Repetitively-Pulsed Ion Beam
摘要
The features of the synergy of high-intensity implantation of chromium ions into Zr1%Nb alloy with simultaneous repetitively-pulsed energy impact of a high-power density beam on the irradiated surface have been studied. The possibility of deep ion alloying (up to 7 µm) with a maximum concentration of implanted atoms at the surface of up to 60 at % has been demonstrated for the first time. It has been revealed that chromium distribution in Zr1%Nb alloy over both the surface and the depth of the target is inhomogeneous. The possibility of providing conditions for deep radiation-enhanced diffusion in the surface layer while preserving the microstructure of the material outside the ion-alloyed region has been experimentally confirmed. The effect of refining the crystal structure in an ion-doped layer under conditions of multiple repetitively-pulsed energy impact of a high-power density ion beam on the alloy surface has been discovered.