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Abstract <p>The paper presents the results of development and fabrication of X-ray microlenses from X-ray amorphous material, silica, by ion-beam lithography using modern systems combining a focused ion beam and a scanning electron microscope. The possibility of fabrication of glass microlenses with a concave parabolic profile and curvature radii from 2 to 30 μm and an aperture of 20 μm is demonstrated. A method for removing the redeposited layer using 5% hydrofluoric acid is tested. The achieved accuracy of parabolic microlens profile fabrication is less than 30 nm (minimum–maximum scatter), and the RMS roughness of the optical surface is less than 10 nm. The optical characteristics of silica microlenses for high-resolution X‑ray microscopy applications for new-generation synchrotron sources are evaluated.</p>

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Fabrication of Silica X-ray Microlenses by Ion-Beam Lithography

  • 期刊论文

  • 发表日期：

    2025年8月1日

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  • I. I. Lyatun,
  • S. S. Lyatun,
  • V. A. Yunkin,
  • A. A. Snigirev

摘要

Abstract

The paper presents the results of development and fabrication of X-ray microlenses from X-ray amorphous material, silica, by ion-beam lithography using modern systems combining a focused ion beam and a scanning electron microscope. The possibility of fabrication of glass microlenses with a concave parabolic profile and curvature radii from 2 to 30 μm and an aperture of 20 μm is demonstrated. A method for removing the redeposited layer using 5% hydrofluoric acid is tested. The achieved accuracy of parabolic microlens profile fabrication is less than 30 nm (minimum–maximum scatter), and the RMS roughness of the optical surface is less than 10 nm. The optical characteristics of silica microlenses for high-resolution X‑ray microscopy applications for new-generation synchrotron sources are evaluated.