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<p>The paper considers a possibility of controlling the structure of a fluoropolymer coating by diluting the precursor gas with an inert gas during synthesis by the Hot Wire Chemical Vapor Deposition method (Hot Wire CVD). Dilution of the precursor gas affects significantly the morphology of the formed coating and changes the coating wettability and the growth rate.</p>

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The effect of diluting the precursor gas with an inert gas on the structure, composition, and wettability of coating deposited by the HW CVD method

  • 期刊论文

  • 发表日期：

    2025年7月1日

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  • A. V. Petrova,
  • I. N. Lyapustin,
  • V. S. Sulyaeva,
  • A. I. Safonov

摘要

The paper considers a possibility of controlling the structure of a fluoropolymer coating by diluting the precursor gas with an inert gas during synthesis by the Hot Wire Chemical Vapor Deposition method (Hot Wire CVD). Dilution of the precursor gas affects significantly the morphology of the formed coating and changes the coating wettability and the growth rate.