Effect of Reactive Magnetron Sputtering Modes (DCMS, HIPIMS, and DC + HIPIMS) on the Properties of Copper Oxide Films
摘要
Copper oxide (CuO) films have been grown by reactive DC magnetron sputtering, high-power impulse magnetron sputtering (HIPIMS), and a hybrid process (DC + HIPIMS). Their resistivity has been measured by the four probe van der Pauw method, and their rms surface roughness has been assessed by atomic force microscopy. The phase composition of the films has been determined by X-ray diffraction, and their chemical state has been studied by X-ray photoelectron spectroscopy. Their band gap has been determined by the Tauc method using their transmission and reflection spectra measured on a spectrophotometer. The results have been used for a comparative analysis of the properties of the CuO films grown in different deposition modes and to demonstrate advantages and drawbacks of the magnetron sputtering modes used.