Abstract <p>The article focuses on a comprehensive theoretical model for wave reflection in a rotating, isotropic semiconductor half-space exposed to laser pulse heating. The formulation incorporates the combined effects of variable thermal conductivity, hydrostatic initial stress, Eringen’s nonlocal elasticity, and the three-phase lag (3PL) heat conduction model an integrated approach not previously applied in wave propagation studies. The governing equations account for Coriolis and centrifugal forces due to rotation, as well as laser-induced carrier dynamics. A key contribution of this work is the use of Global Sensitivity Analysis (GSA) with Sobol indices to systematically evaluate the influence of physical parameters on reflection amplitudes. The results reveal that nonlocal effects soften the stress field, reducing reflection by dispersing energy across microstructural scales, while temperature-dependent conductivity alters thermal gradients and stress localization. These findings provide new physical insights into thermo-mechanical wave behavior in microscale semiconductor media and inform the design of advanced opto-thermoelastic systems.</p>

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Global Sensitivity Analysis of Wave Behavior in Rotating Solids with Laser-Induced Thermal and Stress Effects

  • Maaz Ali Khan,
  • Adnan Jahangir,
  • Afzal Rahman,
  • Emad E. Mahmoud,
  • Mohammed Almuzaini

摘要

Abstract

The article focuses on a comprehensive theoretical model for wave reflection in a rotating, isotropic semiconductor half-space exposed to laser pulse heating. The formulation incorporates the combined effects of variable thermal conductivity, hydrostatic initial stress, Eringen’s nonlocal elasticity, and the three-phase lag (3PL) heat conduction model an integrated approach not previously applied in wave propagation studies. The governing equations account for Coriolis and centrifugal forces due to rotation, as well as laser-induced carrier dynamics. A key contribution of this work is the use of Global Sensitivity Analysis (GSA) with Sobol indices to systematically evaluate the influence of physical parameters on reflection amplitudes. The results reveal that nonlocal effects soften the stress field, reducing reflection by dispersing energy across microstructural scales, while temperature-dependent conductivity alters thermal gradients and stress localization. These findings provide new physical insights into thermo-mechanical wave behavior in microscale semiconductor media and inform the design of advanced opto-thermoelastic systems.