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Abstract <p>Solid hafnia-doped silicon carbonitride coatings are synthesized using laser plasma in a high-speed argon flow from hexamethyldisilazane (HMDS) Si<sub>2</sub>NH(CH<sub>3</sub>)<sub>6</sub> and hafnium dipivaloylmethane Hf(dpm)<sub>4</sub> vapor mixture. The coatings are characterized by X-ray photoelectron, IR, and Raman spectroscopy techniques. The structural studies are carried out by powder XRD; the coating hardnesses are measured by nanoindentation. The hardness of the coatings synthesized on stainless steel from a HMDS and Hf(dpm)<sub>4</sub> mixture is 21-24&#xa0;GPa at a Hf(dpm)<sub>4</sub> concentration of up to 2.5&#xa0;wt.&#xa0;% and decreases to 7&#xa0;GPa if the Hf(dpm)<sub>4</sub> content increases in a mixture to 4.5&#xa0;wt.&#xa0;%.</p>

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Laser Plasma-Chemical Deposition of Hafnia-Doped Solid Silicon Carbonitride Coatings

  • 期刊论文

  • 发表日期：

    2025年5月1日

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  • V. N. Demin,
  • I. P. Asanov,
  • A. L. Smirnov,
  • M. N. Khomyakov,
  • P. A. Pinaev,
  • S. N. Bagaev

摘要

Abstract

Solid hafnia-doped silicon carbonitride coatings are synthesized using laser plasma in a high-speed argon flow from hexamethyldisilazane (HMDS) Si2NH(CH3)6 and hafnium dipivaloylmethane Hf(dpm)4 vapor mixture. The coatings are characterized by X-ray photoelectron, IR, and Raman spectroscopy techniques. The structural studies are carried out by powder XRD; the coating hardnesses are measured by nanoindentation. The hardness of the coatings synthesized on stainless steel from a HMDS and Hf(dpm)4 mixture is 21-24 GPa at a Hf(dpm)4 concentration of up to 2.5 wt. % and decreases to 7 GPa if the Hf(dpm)4 content increases in a mixture to 4.5 wt. %.