Effect of the Water Pulse Duration on the Stoichiometry of HfOx Films Obtained from Tetrakis(Dimethylamino)Hafnium
摘要
Abstract
We present the results of studying HfOx films formed from tetrakis(dimethylamino)hafnium with different times of water supply pulses. The stoichiometry of the samples obtained is estimated by spectral ellipsometry and Auger electron spectroscopy. It is shown that an increase in the water supply duration promotes an increase in the x value in the HfOx layer. When the time of water supply pulses varies from 10 ms to 1000 ms, x values ranging from 1.76 to 1.84 are obtained. A method based on the refractive index is proposed to estimate the stoichiometry of HfOx layers.