错误:搜索内容不能为空,请输入英文关键词
错误:关键词超出字数限制,请精简
高级检索

Halogen Bonds in the Structure of Tetrabromophenylbutane

  • G. G. Korablev,
  • P. V. Dorovatovskii,
  • A. N. Efremov,
  • A. A. Osipov,
  • K. Rajakumar,
  • S. A. Nayfert,
  • D. A. Zherebtsov

摘要

Abstract

The crystal structure of 1,2,3,4-tetrabromo,1-phenylbutane determined by single crystal synchrotron X-ray diffraction is described. Molecules of the compound compose a layered structure of the Langmuir–Blodgett film type (with tail-to-tail, head-to-head orientations of molecules of the neighboring layers) in which phenyl radicals of one layer contact with those of another. Halogen bonds and Br⋯Br contacts (four per each molecule) have the key importance for the molecular packing in the layer. The distance between bromine atoms in these bonds and contacts is 3.656-4.002 Å. The thermal analysis shows that the tetrabromophenylbutane melting point is 148 °C, with the compound starting to decompose at 150-280 °C in one step with releasing HBr and benzene.