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<p>We report the development of a large-area plane Varied Line-Space grating with line density varying exponentially along the grating surface roughly from 160 to 560 mm<sup>–1</sup>. The grating was produced using e-beam lithography with original square-stamp beam profile and is intended for an innovative high-resolution single-component grazing-incidence monochromator, in which wavelength scanning is achieved simply by linear movement of the grating along its surface. For a grating width of 60 mm, the first-order operating spectral range is 9–20 nm. Optical measurements of the line density-versus-coordinate dependence reveal perfect match between the fabricated and intended by the design density dependences.</p>

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VLS Grating for X-Ray Optics as Fabricated by e-Beam Nanolithography with Optically Confirmed Exponential Line-Density Variation

  • 期刊论文

  • 出版模式：

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  • 发表日期：

    2026年2月24日

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  • A. I. Arzhanov,
  • V. V. Shulga,
  • A. S. Shelkovnikov,
  • K. E. Aleksashin,
  • A. Yu. Neliubov,
  • A. O. Kolesnikov,
  • M. D. Logachev,
  • A. N. Shatokhin,
  • E. A. Vishnyakov,
  • E. N. Ragozin,
  • A. V. Naumov

摘要

We report the development of a large-area plane Varied Line-Space grating with line density varying exponentially along the grating surface roughly from 160 to 560 mm–1. The grating was produced using e-beam lithography with original square-stamp beam profile and is intended for an innovative high-resolution single-component grazing-incidence monochromator, in which wavelength scanning is achieved simply by linear movement of the grating along its surface. For a grating width of 60 mm, the first-order operating spectral range is 9–20 nm. Optical measurements of the line density-versus-coordinate dependence reveal perfect match between the fabricated and intended by the design density dependences.