<p>The nonlinear interaction of 250-fs laser pulses at a wavelength of 1030 nm with polymethyl methacrylate is investigated using an optimized <i>z</i>-scan technique. It is shown that the mechanism of pulse attenuation for peak intensities below 0.65 TW/cm<sup>2</sup> can be described as four-photon absorption with the coefficient β<sub>4</sub> = (35&#xa0;± 5) cm<sup>5</sup>/TW<sup>3</sup>. The nonlinear refractive index <i>n</i><sub>2</sub> = (7.6 ± 0.4) × 10<sup>−4</sup> cm<sup>2</sup>/TW and the critical power for the onset of self-focusing <i>P</i><sub>cr</sub> = (1.42 ± 0.08) MW are determined and these results are used to demonstrate the correspondence between the calculated shift of the nonlinear focal point and the location of the laser-modified regions.</p>

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Nonlinear Absorption of 1030-nm Ultrashort Laser Pulses in Polymethyl Methacrylate

  • Yu. S. Gulina,
  • J. Zhu,
  • A. V. Gorevoy,
  • N. I. Dolzhenko,
  • P. A. Danilov,
  • E. N. Rimskaya,
  • S. I. Kudryashov

摘要

The nonlinear interaction of 250-fs laser pulses at a wavelength of 1030 nm with polymethyl methacrylate is investigated using an optimized z-scan technique. It is shown that the mechanism of pulse attenuation for peak intensities below 0.65 TW/cm2 can be described as four-photon absorption with the coefficient β4 = (35 ± 5) cm5/TW3. The nonlinear refractive index n2 = (7.6 ± 0.4) × 10−4 cm2/TW and the critical power for the onset of self-focusing Pcr = (1.42 ± 0.08) MW are determined and these results are used to demonstrate the correspondence between the calculated shift of the nonlinear focal point and the location of the laser-modified regions.