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Abstract <p>An addition to an electron lithograph based on an optical microscope for fast patterning of large-scale elements by the method of contact mask photolithography in ultraviolet radiation on an electronic resistor is presented. The device accelerates the creation of contact pads for solid-state micro- and nanostructures and reduces the risk of sample loss when working with fragile structures.</p>

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Two-Step Photoelectron Lithography for Working with Fragile Nanostructures

  • 期刊论文

  • 发表日期：

    2025年4月1日

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  • S. G. Martanov,
  • E. V. Tarkaeva,
  • V. A. Ievleva,
  • A. U. Kuntsevich

摘要

Abstract

An addition to an electron lithograph based on an optical microscope for fast patterning of large-scale elements by the method of contact mask photolithography in ultraviolet radiation on an electronic resistor is presented. The device accelerates the creation of contact pads for solid-state micro- and nanostructures and reduces the risk of sample loss when working with fragile structures.