The Study of the Movement of Electrons in the CF4 Gas Using Monte Carlo Simulation in Uniform Electric Field
摘要
Carbon Tetrafluoride (CF4) plasmas are widely used in plasma processing technologies, especially in dry etching of silicon-based materials and surface passivation, due to their high chemical stability and ability to generate reactive species. However, accurate knowledge of electrons swarm parameters is essential for better understanding and modelling of the electrical discharge processes. In the present study, the electron transport parameters in CF4 under a uniform electric field were investigated using the Monte Carlo simulations adopting a null collision technique. This technique requires the use of the collision cross sections of the electron with CF4 molecule. The simulation tracks the motion and collisions of electrons to determine parameters such as drift velocity and mean energy as functions of the time for different value of the reduced electric field E/N where (E is the electric field and N is the gas number density of background gas molecules). The results obtained by the Monte Carlo simulation are satisfactory across the entire reduced electric field range E/N.