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<p>We present a cleanroom fabrication process of free-standing open space microfluidic devices with channel widths of ~ 30&#xa0;µm on the wafer scale by means of photolithography in combination with lamination technology.</p>

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Dry resist lamination for wafer-scale fabrication of microfluidic superfusion devices

  • 期刊论文

  • 出版模式：

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  • 发表日期：

    2025年9月25日

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  • Rui Liu,
  • Esteban Pedrueza-Villalmanzo,
  • Aldo Jesorka

摘要

We present a cleanroom fabrication process of free-standing open space microfluidic devices with channel widths of ~ 30 µm on the wafer scale by means of photolithography in combination with lamination technology.