<p>Vacuum ultraviolet (VUV, 100–200 nm) light sources are crucial for advanced spectroscopy, quantum research and semiconductor lithography<sup><CitationRef AdditionalCitationIDS="CR2" CitationID="CR1">1</CitationRef>–<CitationRef CitationID="CR3">3</CitationRef></sup>. Compared with conventional large-scale VUV generation technologies<sup><CitationRef AdditionalCitationIDS="CR5 CR6" CitationID="CR4">4</CitationRef>–<CitationRef CitationID="CR7">7</CitationRef></sup>, second-harmonic generation (SHG) through nonlinear optical (NLO) crystals<sup><CitationRef AdditionalCitationIDS="CR9" CitationID="CR8">8</CitationRef>–<CitationRef CitationID="CR10">10</CitationRef></sup> is the simplest and most efficient method. However, the scarcity of suitable NLO crystals has constrained the production of VUV light through SHG: existing materials fail to meet phase-matching requirements, suffer from low conversion efficiency or have severe growth limitations<sup><CitationRef AdditionalCitationIDS="CR12 CR13 CR14 CR15 CR16 CR17 CR18" CitationID="CR11">11</CitationRef>–<CitationRef CitationID="CR19">19</CitationRef></sup>. In this study, we report the development of the fluorooxoborate crystal NH<sub>4</sub>B<sub>4</sub>O<sub>6</sub>F (abbreviated as ABF) as a promising material for VUV light generation. VUV devices with specific phase-matching angles were constructed, achieving a record 158.9-nm light through phase-matching SHG and a maximum nanosecond pulse energy of 4.8 mJ at 177.3 nm with a conversion efficiency of 5.9%. The enhanced NLO performance is attributed to optimized arrangements of fluorine-based units creating asymmetric sublattices. This work provides further material in the NLO field, with potential for applications in compact, high-power VUV lasers using ABF.</p>

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Vacuum ultraviolet second-harmonic generation in NH4B4O6F crystal

  • Fangfang Zhang,
  • Zilong Chen,
  • Chen Cui,
  • Zhihua Yang,
  • Miriding Mutailipu,
  • Fuming Li,
  • Xueling Hou,
  • Xifa Long,
  • Shilie Pan

摘要

Vacuum ultraviolet (VUV, 100–200 nm) light sources are crucial for advanced spectroscopy, quantum research and semiconductor lithography13. Compared with conventional large-scale VUV generation technologies47, second-harmonic generation (SHG) through nonlinear optical (NLO) crystals810 is the simplest and most efficient method. However, the scarcity of suitable NLO crystals has constrained the production of VUV light through SHG: existing materials fail to meet phase-matching requirements, suffer from low conversion efficiency or have severe growth limitations1119. In this study, we report the development of the fluorooxoborate crystal NH4B4O6F (abbreviated as ABF) as a promising material for VUV light generation. VUV devices with specific phase-matching angles were constructed, achieving a record 158.9-nm light through phase-matching SHG and a maximum nanosecond pulse energy of 4.8 mJ at 177.3 nm with a conversion efficiency of 5.9%. The enhanced NLO performance is attributed to optimized arrangements of fluorine-based units creating asymmetric sublattices. This work provides further material in the NLO field, with potential for applications in compact, high-power VUV lasers using ABF.