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Propagation of insulator-to-metal transition driven by photoinduced strain waves in a Mott material

  • Tatsuya Amano,
  • Danylo Babich,
  • Ritwika Mandal,
  • Julio Guzman-Brambila,
  • Alix Volte,
  • Elzbieta Trzop,
  • Marina Servol,
  • Ernest Pastor,
  • Maryam Alashoor,
  • Jörgen Larsson,
  • Andrius Jurgilaitis,
  • Van-Thai Pham,
  • David Kroon,
  • John Carl Ekström,
  • Byungnam Ahn,
  • Céline Mariette,
  • Matteo Levantino,
  • Mikhail Kozhaev,
  • Julien Tranchant,
  • Benoit Corraze,
  • Laurent Cario,
  • Mohammad Dolatabadi,
  • Vinh Ta Phuoc,
  • Rodolphe Sopracase,
  • Mathieu Guillon,
  • Hirotake Itoh,
  • Yohei Kawakami,
  • Yuto Nakamura,
  • Hideo Kishida,
  • Hervé Cailleau,
  • Maciej Lorenc,
  • Shinichiro Iwai,
  • Etienne Janod

摘要

Ultrafast photoexcitation can generate internal compressive stress in Mott insulators that lead to strain waves from free surfaces. These photoinduced elastic waves can trigger phase transitions in materials. However, a comprehensive physical picture of the phase transformation dynamics that includes acoustic-scale propagation has not yet been developed. Here we demonstrate that such a strain-wave mechanism drives the ultrafast insulator-to-metal phase transition in granular thin films of the Mott material V2O3. Our time-resolved optical reflectivity and X-ray diffraction measurements reveal that an inverse ferroelastic shear occurs before the insulator-to-metal transition, which propagates in the wake of a compressive strain wave. These dynamics are governed by the domain size and film thickness, respectively. Our results clarify the morphological conditions for the ultrafast phase transition that is favoured in granular thin films and hindered in single crystals. The resulting physical picture sheds light on the ultrafast phase transitions in quantum materials and future devices based on Mott insulators.