<p>Metal-halide perovskites offer high optoelectronic performance but translating laboratory efficiencies into controllable, reproducible processes remains challenging. Perovskite crystallization is tracked by in situ multiwavelength absorption to show that coherent, layer-by-layer conversion of low-n intermediates to three-dimensional perovskite, quantified by a transformation index (TI), correlates with device quality. TI displays a Sabatier-type dependence on additive–precursor interaction strength and concentration, defining an engineering window for reproducible film formation. Within this window, post-treatment-free devices reach a champion power conversion efficiency of 26.40% with improved stability and reduced device scatter at laboratory scale. TI is extractable from an inline optical readout and provides a measurable metric for additive screening and process tuning. Its applicability to scalable deposition is further validated through slot-die coated mini-modules, offering a practical pathway for inline process control.</p>

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Coherent transformation of metal halide perovskites

  • Pinghui Yang,
  • Haokun Shi,
  • Zhen Wang,
  • Shuaijun Yan,
  • Xiliu Wang,
  • Bo Xu,
  • Junbo Wang,
  • Kaidi Liu,
  • Xuan Gao,
  • Wenbo Liu,
  • Fangfang Wang,
  • Lin Zhu,
  • Renzhi Li,
  • Wei Huang,
  • Jianpu Wang

摘要

Metal-halide perovskites offer high optoelectronic performance but translating laboratory efficiencies into controllable, reproducible processes remains challenging. Perovskite crystallization is tracked by in situ multiwavelength absorption to show that coherent, layer-by-layer conversion of low-n intermediates to three-dimensional perovskite, quantified by a transformation index (TI), correlates with device quality. TI displays a Sabatier-type dependence on additive–precursor interaction strength and concentration, defining an engineering window for reproducible film formation. Within this window, post-treatment-free devices reach a champion power conversion efficiency of 26.40% with improved stability and reduced device scatter at laboratory scale. TI is extractable from an inline optical readout and provides a measurable metric for additive screening and process tuning. Its applicability to scalable deposition is further validated through slot-die coated mini-modules, offering a practical pathway for inline process control.