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<p>The continuous shrinkage of critical dimensions in nanofabrication demands nanometrology at the relevant resolution, which can be achieved using short-wavelength light sources. Most industrial metrology uses periodic structures for process control, exploiting diffraction to probe the fabrication quality of actual device structures. Here, we introduce a table-top high-harmonic generation extreme-ultraviolet scatterometry with broadband illumination. Our method exploits the spectrally resolved 0<sup>th</sup> diffraction order of the extreme-ultraviolet light, which, while lacking spatial-encoded information, carries valuable spectral information and offers high diffraction efficiency. The use of relative reflectivity removes the need for absolute calibration, and rigorous coupled-wave analysis simulations underpin a library-based reconstruction approach, yielding single-nanometer accuracy for groove height and 10 nm accuracy for critical dimensions. Our work demonstrates broadband extreme-ultraviolet high-harmonic-generation 0<sup>th</sup> order scatterometry that delivers fast, reliable, non-destructive metrology for structures with at-wavelength features, providing sensitivity and accuracy for details far below the diffraction limit.</p>

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Broadband extreme ultraviolet zeroth order scatterometry for nanostructure metrology

  • 期刊论文

  • 出版模式：

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  • 发表日期：

    2026年5月19日

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  • Francesco Corazza,
  • Emmanouil Kechaoglou,
  • Leo Guery,
  • Zhonghui Nie,
  • Parikshit Phadke,
  • Carl S. Lehmann,
  • Roland Bliem,
  • Peter M. Kraus

摘要

The continuous shrinkage of critical dimensions in nanofabrication demands nanometrology at the relevant resolution, which can be achieved using short-wavelength light sources. Most industrial metrology uses periodic structures for process control, exploiting diffraction to probe the fabrication quality of actual device structures. Here, we introduce a table-top high-harmonic generation extreme-ultraviolet scatterometry with broadband illumination. Our method exploits the spectrally resolved 0th diffraction order of the extreme-ultraviolet light, which, while lacking spatial-encoded information, carries valuable spectral information and offers high diffraction efficiency. The use of relative reflectivity removes the need for absolute calibration, and rigorous coupled-wave analysis simulations underpin a library-based reconstruction approach, yielding single-nanometer accuracy for groove height and 10 nm accuracy for critical dimensions. Our work demonstrates broadband extreme-ultraviolet high-harmonic-generation 0th order scatterometry that delivers fast, reliable, non-destructive metrology for structures with at-wavelength features, providing sensitivity and accuracy for details far below the diffraction limit.