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<p>The reliability of through-glass via (TGV) interconnects is critical for advanced semiconductor packaging. This work investigates microstructural and mechanical evolution in electroplated TGV–Cu subjected to long-term aging at 250 °C. TGV samples were fabricated via laser-induced etching and double-sided copper electroplating, then aged for up to 1008 h. Nanoindentation revealed region-dependent reductions in hardness (from 2.0–2.5 GPa to below 0.5 GPa) and modulus (from 110–130 GPa to 40–90 GPa), with surface-near regions most affected. The glass substrate maintained stable mechanical properties until microcracks formed after 1008 h. EBSD quantification showed grain-size enlargement from 0.46 µm to 1.86 µm and a concurrent decrease in dislocation density. Molecular dynamics simulations of 3, 4, 5 nm grains corroborated the inverse relationship between grain size and micro-mechanical properties. A hybrid Potts-phase field model further linked grain coarsening to stress relaxation and elastic-energy minimization, revealing that as grains grow, the overall von Mises stress in the structure decreases; high-modulus grains retain relatively higher local stresses, while low-modulus, low-stress grains exhibit faster growth rates. Electrical I–V measurements confirmed stable ohmic behavior, despite a drop in insulation resistance. These integrated experimental and computational insights provide theoretical guidance for optimizing TGV interposer design and ensuring long-term operational reliability in heterogeneous integration technologies.</p><p></p>

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Long-term high-temperature aging mechanism of copper-metallized through-glass vias: a combined nanoindentation test and hybrid Potts-phase field simulation study

  • 期刊论文

  • 出版模式：

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  • 发表日期：

    2026年2月2日

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  • Junwei Chen,
  • Zezhan Li,
  • Bin Yang,
  • Xiao Hu,
  • Wenyu Li,
  • Zichuan Li,
  • Xuyang Yan,
  • Zhoudong Yang,
  • Jiao Liang,
  • Guannan Yang,
  • Chao Gu,
  • Changran Zheng,
  • Chengqiang Cui,
  • Guoqi Zhang,
  • Jiajie Fan

摘要

The reliability of through-glass via (TGV) interconnects is critical for advanced semiconductor packaging. This work investigates microstructural and mechanical evolution in electroplated TGV–Cu subjected to long-term aging at 250 °C. TGV samples were fabricated via laser-induced etching and double-sided copper electroplating, then aged for up to 1008 h. Nanoindentation revealed region-dependent reductions in hardness (from 2.0–2.5 GPa to below 0.5 GPa) and modulus (from 110–130 GPa to 40–90 GPa), with surface-near regions most affected. The glass substrate maintained stable mechanical properties until microcracks formed after 1008 h. EBSD quantification showed grain-size enlargement from 0.46 µm to 1.86 µm and a concurrent decrease in dislocation density. Molecular dynamics simulations of 3, 4, 5 nm grains corroborated the inverse relationship between grain size and micro-mechanical properties. A hybrid Potts-phase field model further linked grain coarsening to stress relaxation and elastic-energy minimization, revealing that as grains grow, the overall von Mises stress in the structure decreases; high-modulus grains retain relatively higher local stresses, while low-modulus, low-stress grains exhibit faster growth rates. Electrical I–V measurements confirmed stable ohmic behavior, despite a drop in insulation resistance. These integrated experimental and computational insights provide theoretical guidance for optimizing TGV interposer design and ensuring long-term operational reliability in heterogeneous integration technologies.