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<p>High-efficiency light modulation within transparent substrates is critically important for advancing in-chip integrated optical technologies. However, current micro/nanophotonic platforms primarily rely on 2D surface configurations, rendering them inadequate for 3D optical design in dielectric environments. Here, we introduce a precise phase-transition technique that enables the direct lithography of highly regular amorphous units in multiple transparent dielectric crystals (lithium niobates, quartz, yttrium vanadate, etc.). This unit can be rapidly written with a single ultrafast laser pulse, exhibiting a high-purity amorphization phase transition interior structure and a regular sheet-like anisotropic spatial morphology (aspect ratio reaching 190:1). We reveal that this amorphization stems from ultrafast laser-driven anisotropic thermal deposition, achieved through the synergy of the light-induced high-density free electrons and thermal effects. Such embedded units achieve more than an order of magnitude improvement in the efficiency of nonlinear beam shaping (~3% second harmonic and ~0.1% third harmonic) and offer multiple degrees of freedom for device design. This study establishes a versatile platform for on-demand production of all-dielectric micro/nanophotonic architectures in the free space of transparent dielectrics, unlocking new avenues for 3D integrated photonics.</p>

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Single-pulse lithography of amorphous photonic architectures inside all-inorganic dielectric crystals

  • 期刊论文

  • 出版模式：

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  • 发表日期：

    2026年3月18日

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  • Zhuo Wang,
  • Rongze Ma,
  • Han Lin,
  • Pengfei Zhang,
  • Yu Lu,
  • Feng Chen,
  • Baohua Jia,
  • Bo Zhang,
  • Jianrong Qiu

摘要

High-efficiency light modulation within transparent substrates is critically important for advancing in-chip integrated optical technologies. However, current micro/nanophotonic platforms primarily rely on 2D surface configurations, rendering them inadequate for 3D optical design in dielectric environments. Here, we introduce a precise phase-transition technique that enables the direct lithography of highly regular amorphous units in multiple transparent dielectric crystals (lithium niobates, quartz, yttrium vanadate, etc.). This unit can be rapidly written with a single ultrafast laser pulse, exhibiting a high-purity amorphization phase transition interior structure and a regular sheet-like anisotropic spatial morphology (aspect ratio reaching 190:1). We reveal that this amorphization stems from ultrafast laser-driven anisotropic thermal deposition, achieved through the synergy of the light-induced high-density free electrons and thermal effects. Such embedded units achieve more than an order of magnitude improvement in the efficiency of nonlinear beam shaping (~3% second harmonic and ~0.1% third harmonic) and offer multiple degrees of freedom for device design. This study establishes a versatile platform for on-demand production of all-dielectric micro/nanophotonic architectures in the free space of transparent dielectrics, unlocking new avenues for 3D integrated photonics.