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<p>Accurate displacement sensing is indispensable in advanced semiconductor lithography. Conventional coherent-light-based approaches are hindered by photon budget limitations, slowing down in-situ measurements. In a recent study, Chen et al. introduced a polarization-gradient metasurface integrated with two-photon quantum interference to achieve equivalent precision with only ~3% of the photons required by classical methods. This work represents a decisive step in merging metasurfaces with quantum resources, paving the way for high-speed, low-noise, and integration-ready displacement metrology.</p>

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Two-photon states meet polarization-gradient metasurfaces for nanometric, low-dose lateral-displacement metrology

  • 期刊论文

  • 出版模式：

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  • 发表日期：

    2026年5月21日

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  • Qian-Mei Deng,
  • Jun-Hao Zeng,
  • Feng-Jun Li,
  • Zi-Lan Deng

摘要

Accurate displacement sensing is indispensable in advanced semiconductor lithography. Conventional coherent-light-based approaches are hindered by photon budget limitations, slowing down in-situ measurements. In a recent study, Chen et al. introduced a polarization-gradient metasurface integrated with two-photon quantum interference to achieve equivalent precision with only ~3% of the photons required by classical methods. This work represents a decisive step in merging metasurfaces with quantum resources, paving the way for high-speed, low-noise, and integration-ready displacement metrology.