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<p>The integration of surface-regular micro/nanostructured electrodes within a limited footprint area is promising to enhance the electrochemical performance of planar micro-supercapacitors (P-MSCs), while developing simple yet efficient manufacturing methods for such electrodes remains a challenge. Here, we propose a universal strategy combining femtosecond laser plasma lithography with spatial light modulation (SLM-FPL), fabricating well-ordered sub-wavelength micro/nanostructured electrodes of interdigital P-MSCs (SEP-MSCs) on graphene oxide (GO) films. Achieving 500/50 µm finger widths/spacings and 680 nm internal grating periods, this method enables device densities &gt;25 units inch<sup>−2</sup> with processing efficiency orders of magnitude higher than conventional laser direct writing. Further performance optimizations via wettability modification, electric field engineering, and hybrid composites (GO-MXene/COF) yield outstanding specific capacitance (~41.4 F cm<sup>−3</sup>) and cycling stability (93% retention over 5000 cycles), supporting applications in flexible sensors and compact power supplies. This SLM-FPL technology shows strong potential for high-performance, spatially efficient SEP-MSCs in next-generation integrated systems.</p>

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High-efficiency femtosecond laser fabrication of graphene-hybrid planar micro-supercapacitors with micro/nanostructured electrodes

  • 期刊论文

  • 出版模式：

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  • 发表日期：

    2026年1月21日

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  • Yuyuan Zhang,
  • Tingting Zou,
  • Haobo Jiang,
  • Xiuyan Fu,
  • Wei Xin,
  • Yiyang Meng,
  • Xilin Li,
  • Jun-Ming Cao,
  • Lin Yang,
  • Yuanzheng Li,
  • Weizhen Liu,
  • Dongdong Han,
  • Xing-Long Wu,
  • Jianjun Yang,
  • Haiyang Xu,
  • Yichun Liu

摘要

The integration of surface-regular micro/nanostructured electrodes within a limited footprint area is promising to enhance the electrochemical performance of planar micro-supercapacitors (P-MSCs), while developing simple yet efficient manufacturing methods for such electrodes remains a challenge. Here, we propose a universal strategy combining femtosecond laser plasma lithography with spatial light modulation (SLM-FPL), fabricating well-ordered sub-wavelength micro/nanostructured electrodes of interdigital P-MSCs (SEP-MSCs) on graphene oxide (GO) films. Achieving 500/50 µm finger widths/spacings and 680 nm internal grating periods, this method enables device densities >25 units inch−2 with processing efficiency orders of magnitude higher than conventional laser direct writing. Further performance optimizations via wettability modification, electric field engineering, and hybrid composites (GO-MXene/COF) yield outstanding specific capacitance (~41.4 F cm−3) and cycling stability (93% retention over 5000 cycles), supporting applications in flexible sensors and compact power supplies. This SLM-FPL technology shows strong potential for high-performance, spatially efficient SEP-MSCs in next-generation integrated systems.