Maskless photolithography for micro- and nanofabrication
摘要
As a micro- and nanofabrication technique, maskless photolithography (MPL) eliminates static physical masks and instead utilizes computer-controlled light sources and optical systems to directly generate patterns. This significantly enhances process flexibility and design freedom and reduces production costs. It is an important technology that supports the field of advanced micro- and nanofabrication. This review systematically elaborates on the principles and equipment systems of MPL technology, introduces the development history and photoreaction mechanisms of different types of photoresponsive materials, and summarizes the application of MPL technology in micro- and nanofabrication. Finally, the prospects and future directions for the development of MPL technology are presented.