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<p>As the demand for advanced optical glass technology increases, improving polishing slurries to enhance material removal rate and reduce surface roughness has become a priority. Cerium oxide is the most widely used abrasive for glass polishing, and its polishing rate is regarded to increase as the surface Ce<sup>3</sup>⁺ content rises. To improve this, Nd<sup>3+</sup>-doped cerium oxide was prepared using a molten salt method. Morphological and X-ray photoelectron spectroscopy (XPS) analyses showed that the Nd<sup>3+</sup> doping increased Ce<sup>3</sup>⁺ content and transformed the particles into an octahedral structure. Additionally, Nd<sup>3</sup>⁺ doping enhanced the mechanical action, as evidenced by an increased friction coefficient and reduced contact angle. When the doping amount is 4%, Ce<sup>3</sup>⁺ content and material removal rate peaked at 47.87&#xa0;nm/min, while the doping amount is 8%, mechanical and chemical synergy achieved the lowest surface roughness of 1.38&#xa0;nm.</p>

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Dual impact of Nd3+ doping on CeO2 abrasives: enhancing chemical and mechanical effects in chemical–mechanical polishing

  • 期刊论文

  • 出版模式：

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  • 发表日期：

    2025年2月18日

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  • Yesheng Zhang,
  • Hong Lei,
  • Jianhua Zhang,
  • Liqiang Luo

摘要

As the demand for advanced optical glass technology increases, improving polishing slurries to enhance material removal rate and reduce surface roughness has become a priority. Cerium oxide is the most widely used abrasive for glass polishing, and its polishing rate is regarded to increase as the surface Ce3⁺ content rises. To improve this, Nd3+-doped cerium oxide was prepared using a molten salt method. Morphological and X-ray photoelectron spectroscopy (XPS) analyses showed that the Nd3+ doping increased Ce3⁺ content and transformed the particles into an octahedral structure. Additionally, Nd3⁺ doping enhanced the mechanical action, as evidenced by an increased friction coefficient and reduced contact angle. When the doping amount is 4%, Ce3⁺ content and material removal rate peaked at 47.87 nm/min, while the doping amount is 8%, mechanical and chemical synergy achieved the lowest surface roughness of 1.38 nm.