Effect of Elemental Concentration on Microstructure, Mechanical, and Tribological Properties of (AlNbSiTiZr)N Thin Films
摘要
(AlNbSiTiZr)N thin films were deposited on silicon wafers and steel substrates using pulsed DC magnetron sputtering with four distinct targets (AlSi, Ti, Nb, Zr). Elemental concentrations were controlled by adjusting the discharge current, while maintaining a film thickness of approximately 1.3 μm. Three films with slightly varied compositions were investigated to assess the impact of compositional changes on their structure and properties. Structural analysis revealed a dual-phase microstructure consisting of an amorphous matrix and a FCC solid solution phase, with a transition toward a FCC-dominant structure and a pronounced (200) orientation as Nb and Zr contents increased. This phase evolution was accompanied by lattice expansion, grain growth, and increased lattice distortion driven by atomic size differences. As a result, hardness improved significantly from 12.7 ± 0.7 GPa to 20.8 ± 0.5 GPa, primarily due to solid solution strengthening. Tribological tests under dry air with a 0.5 N load over 1000 sliding cycles showed a significant wear rate reduction from 10–5 to 10–6 mm3/Nm, correlating strongly with the enhanced H/Er and H3/Er2 ratios. These results demonstrate the potential of targeted compositional adjustments to tailor the mechanical and tribological properties of high entropy nitride coatings for wear-resistant applications.