Sputtering power–controlled surface engineering of aluminium doped ZnO thin films for enhanced photovoltaic performance
摘要
Zinc oxide doped with aluminum (ZnO:Al) has emerged as a promising transparent conducting oxide (TCO) material owing to its unique combination of high transparency, low resistivity, low cost, non-toxicity, and chemical stability. In this study, ZnO:Al thin films were deposited on soda lime glass substrates via RF magnetron sputtering under varying RF powers (50–250 W). The structural, optical, electrical, and wettability properties were analyzed to understand the impact of deposition power. All films exhibited a hexagonal wurtzite structure with a strong (0002) orientation, high transparency (> 80%), and hydrophobic nature with an average contact angle of ~ 89.96°. The minimum resistivity (1.52 × 10−3 Ω cm) was observed for films deposited at 200 W for 30 min. The results demonstrate the potential of ZnO:Al thin films as TCO materials for optoelectronic and solar cell applications.
Graphical abstract