In-plane and out-of-plane strain gradient modulation of the linear photogalvanic effect in monolayer Td-WTe2
摘要
The linear photogalvanic effect (LPGE) in monolayer Td-WTe2 is systematically investigated under two complementary strain-engineering strategies—lateral strain gradients and single-end bending—using a combined nonequilibrium Green’s function and density functional theory approach. Unlike uniform tensile or compressive strains, which induce only limited and narrowly tunable responses, both gradient and bending strains significantly reshape the electronic structure near the Fermi level, introducing flat bands and high-density states that generate internal electric fields and promote carrier separation. For lateral strain gradients, progressively smoother profiles lead to stronger band distortion, enhanced density of states, and redshifted, amplified LPGE response. The maximum photoresponse Rmax rises from 12.5