Low-cost Fabrication of Isooctyl Acrylate Polymer Periodic Structures by Laser Interference Photocuring
摘要
Facing the challenge of expensive photoresist and complex process flow for the fabrication of submicron structures based on laser interference lithography, we propose a low-cost fabrication method for submicron periodic structures with isooctyl acrylate by laser interference photocuring, which simplifies more processes and reduces costs. Results showed that the period of the grating structures is approximately 0.97 ± 0.01 µm, and the minimum feature size can reach 0.24 ± 0.02 µm. The period of the dot array is approximately 0.98 ± 0.01 µm for dx and 1.97 ± 0.01 µm for dy, and the minimum feature size is 0.64 ± 0.01 µm. In addition, we demonstrate the diffraction properties of the grating structures. In conclusion, we propose a new method for fabricating submicron grating structures with high efficiency and low cost.