Asymmetric deformation-induced pattern mapping in soft materials regulated by selective photo-crosslinking
摘要
Asymmetric deformations in soft materials are ubiquitous in nature and play a crucial role in various biological and mechanical processes, yet current fabrication strategies primarily focus on introducing anisotropy while overlooking the internal transfer of stress, energy, or matter. In this work, we discovered a pattern mapping behavior driven by the selective distribution of photochemical crosslinking regions and the application of external stress fields, resulting in complementary mappable structures on the opposite side of the material. Theoretical simulations and experimental results reveal that the key to pattern mapping lies in the asymmetric deformation along the stretching direction of the material, coupled with the migration of polymer chains within the soft material. Employing complementary stress fields, 2D ordered or 3D hierarchical patterns can be precisely mapped onto both sides. Moreover, upon thermal stimulation, the mapped patterns and macroscopic deformations demonstrate outstanding reversibility across multiple cycles. This result reveals mapping behaviors induced by asymmetric deformations and polymer chain migration within soft materials under external stress fields, offering valuable insights for designing structures with interactive functionalities.