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<p>Conventional photolithography is inherently limited to flat, rigid, and stable substrates, which severely restricts its applicability to flexible, curved, and transient electronic devices. This work presents an innovative transfer method that exploits a phase-changing polymer with dynamically switchable adhesion to enable universal transfer of commercial photoresists onto a broad range of previously incompatible substrates, thereby overcoming the fundamental limitations of traditional photolithography. Remarkably, this method achieves reliable wafer-scale (~ 4-inch) transfer with a global registration error below 60&#xa0;µm, unlocking high-fidelity patterning on challenging surfaces such as solvent-sensitive, curved, microtextured, or fragile substrates. Combined with dry etching, this study demonstrates a new route for high-resolution patterning of delicate functional materials, including quantum dots and organic semiconductors. Moreover, it supports a sustainable “dry lift-off” process for patterning functional layers, demonstrating a successful high-resolution microfabrication on paper-based substrate. The reusability of both the transfer carrier and photoresist markedly enhances process sustainability and scalability, representing a significant advance in microfabrication. This unprecedented capability is further demonstrated by fabricating a micro-sized UV photodetector array featuring wide-angle sensing capability on a curved glass bottle. </p>

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Scalable and Sustainable Dry Microfabrication Enabled by High-Precision and Wafer-Scale Transfer Lithography of Commercial Photoresists

  • 期刊论文

  • 出版模式：

    开放获取

  • 发表日期：

    2026年5月7日

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  • Qinhua Guo,
  • Zhiqing Xu,
  • Lizhou Yang,
  • Jingyang Zhang,
  • Yawen Gan,
  • Jiajun Zhang,
  • Jiahao Jiang,
  • Yunda Wang

摘要

Conventional photolithography is inherently limited to flat, rigid, and stable substrates, which severely restricts its applicability to flexible, curved, and transient electronic devices. This work presents an innovative transfer method that exploits a phase-changing polymer with dynamically switchable adhesion to enable universal transfer of commercial photoresists onto a broad range of previously incompatible substrates, thereby overcoming the fundamental limitations of traditional photolithography. Remarkably, this method achieves reliable wafer-scale (~ 4-inch) transfer with a global registration error below 60 µm, unlocking high-fidelity patterning on challenging surfaces such as solvent-sensitive, curved, microtextured, or fragile substrates. Combined with dry etching, this study demonstrates a new route for high-resolution patterning of delicate functional materials, including quantum dots and organic semiconductors. Moreover, it supports a sustainable “dry lift-off” process for patterning functional layers, demonstrating a successful high-resolution microfabrication on paper-based substrate. The reusability of both the transfer carrier and photoresist markedly enhances process sustainability and scalability, representing a significant advance in microfabrication. This unprecedented capability is further demonstrated by fabricating a micro-sized UV photodetector array featuring wide-angle sensing capability on a curved glass bottle.