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<p>Advanced material characterization and electrochemical corrosion behavior of AISI 304 and AISI 316 were examined in hydrochloric acid HCl solutions at various concentrations. Advanced electrochemical techniques such as open-circuit potential (OCP) method, potentiodynamic polarization (PDP), Tafel analysis, electrochemical impedance spectroscopy (EIS) were employed to evaluate corrosion kinetics and interfacial processes. Surface morphology and passive film chemistry were further examined using scanning electron microscopy (SEM) and X-ray photo-electron spectroscopy (XPS) to characterize the microstructure and correlate electrochemical responses with microstructural and chemical-state evolution. The corrosion rate of AISI 304 and AISI 316 increased with rising (HCl) concentration from 0.3 to 2&#xa0;M, accompanied by enhanced susceptibility to pitting initiation and propagation. A positive correlation was observed between corrosion rate and acid concentration. Potetiodynamique curves performed at various scan rates and cycle numbers revealed lower pitting resistance in AISI 304 compared to AISI 316 at room temperature 294&#xa0;K. (EIS) revealed that the charge-transfer resistance R<sub>ct</sub> of electrons across the interface between the metal surface and the corrosive medium was highest at HCl and consistently greater for AISI 316 than for AISI 304, indicating superior corrosion resistance and enhanced passive film stability.</p> Graphical Abstract <p></p>

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Electrochemical and Surface Characterization of Corrosion Mechanisms and Passive Film Evolution in AISI 304 and AISI 316 in Hydrochloric Acid

  • 期刊论文

  • 发表日期：

    2026年5月26日

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  • Mustapha Alahiane,
  • Youssef Ait Albrimi,
  • Rachid Ait Akbour,
  • Yassine Riadi,
  • Mohammed H. Geesi,
  • Nizar Azzallou,
  • Mohamed Hamdani

摘要

Advanced material characterization and electrochemical corrosion behavior of AISI 304 and AISI 316 were examined in hydrochloric acid HCl solutions at various concentrations. Advanced electrochemical techniques such as open-circuit potential (OCP) method, potentiodynamic polarization (PDP), Tafel analysis, electrochemical impedance spectroscopy (EIS) were employed to evaluate corrosion kinetics and interfacial processes. Surface morphology and passive film chemistry were further examined using scanning electron microscopy (SEM) and X-ray photo-electron spectroscopy (XPS) to characterize the microstructure and correlate electrochemical responses with microstructural and chemical-state evolution. The corrosion rate of AISI 304 and AISI 316 increased with rising (HCl) concentration from 0.3 to 2 M, accompanied by enhanced susceptibility to pitting initiation and propagation. A positive correlation was observed between corrosion rate and acid concentration. Potetiodynamique curves performed at various scan rates and cycle numbers revealed lower pitting resistance in AISI 304 compared to AISI 316 at room temperature 294 K. (EIS) revealed that the charge-transfer resistance Rct of electrons across the interface between the metal surface and the corrosive medium was highest at HCl and consistently greater for AISI 316 than for AISI 304, indicating superior corrosion resistance and enhanced passive film stability.

Graphical Abstract