Far-UVC (222 nm) in Water Treatment: Disinfection Performance, Micropollutant Degradation, and Implications for Post-Chlorination Disinfection Byproduct Formation
摘要
Far-UVC irradiation at 222 nm (UV222), typically emitted by krypton chloride excimer lamps, has emerged as a promising mercury-free platform for water treatment. This review evaluates recent progress in UV222-based water treatment, with conventional 254 nm UV irradiation (UV254) as the primary benchmark, focusing on disinfection, micropollutant degradation, and UV222-induced dissolved organic matter (DOM) transformation in relation to post-chlorination disinfection byproduct (DBP) formation.
Recent FindingsUV222 shows strong disinfection performance against representative bacteria and viruses, although its relative advantage over UV254 is more variable for fungal spores. For micropollutants, compiled paired photolysis data indicate that UV222 generally accelerates direct photolysis relative to UV254, with the enhancement arising from stronger absorptivity, higher quantum yield, or both depending on compound structure. UV222-based advanced processes further broaden the treatment scope beyond direct photolysis through reactive-species-mediated transformation. However, UV222 can also reshape DOM composition and DBP precursor pools. Sole UV222 may reshape DOM molecular composition without large DBP increases, whereas nitrate-containing systems can selectively amplify halonitromethane formation.
SummaryUV222 should not be viewed simply as a more reactive substitute for UV254. Its practical value depends on balancing disinfection and contaminant-removal benefits against matrix-dependent DOM transformation and downstream DBP risks. Future studies should focus on DOM molecular transformation and DBP precursor restructuring, particularly the role of nitrogen incorporation in linking these two processes, as well as realistic treatment-train evaluations.