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<p>This study optimized the showerhead structure in an ALD chamber using CFD simulations to improve thin film deposition uniformity and reaction rate. A simplified Al<sub>2</sub>O<sub>3</sub> ALD surface reaction model was coupled with flow simulations. In addition, twelve geometrical parameters of the showerhead were optimized via design of experiments and multi-objective evolutionary algorithms. The optimized showerhead design achieved vertical flow patterns within the chamber, resulting in a 3% improvement in film thickness uniformity and a slight increase in growth per cycle compared to the base model. Four distinct optimization cases were investigated, with Case 3 (y-direction flow optimization) demonstrating the best balance between deposition rate and uniformity at 98.31% uniformity. The study revealed that flow directionality affects precursor distribution and purge efficiency, with optimal showerhead configurations showing superior performance compared to chambers without flow control structures. Advanced Latin Hypercube Sampling enabled efficient exploration of the design space while metamodel-based optimization reduced computational requirements. These results demonstrate that tailoring internal flow directionality can significantly enhance ALD process performance.</p>

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Optimization of the Showerhead for Atomic Layer Deposition by Computational Fluid Dynamics

  • 期刊论文

  • 发表日期：

    2026年1月5日

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  • Seung Heon Lee,
  • Do Yeong Jung,
  • Dong Kun Song,
  • Hyeon Do Han,
  • Gyeong Won Min,
  • Da Hye Geum,
  • Jun Geon Park,
  • Seung Wan Bae,
  • Ji Woong Jeon,
  • Hong Sik Kim,
  • Gu Young Cho

摘要

This study optimized the showerhead structure in an ALD chamber using CFD simulations to improve thin film deposition uniformity and reaction rate. A simplified Al2O3 ALD surface reaction model was coupled with flow simulations. In addition, twelve geometrical parameters of the showerhead were optimized via design of experiments and multi-objective evolutionary algorithms. The optimized showerhead design achieved vertical flow patterns within the chamber, resulting in a 3% improvement in film thickness uniformity and a slight increase in growth per cycle compared to the base model. Four distinct optimization cases were investigated, with Case 3 (y-direction flow optimization) demonstrating the best balance between deposition rate and uniformity at 98.31% uniformity. The study revealed that flow directionality affects precursor distribution and purge efficiency, with optimal showerhead configurations showing superior performance compared to chambers without flow control structures. Advanced Latin Hypercube Sampling enabled efficient exploration of the design space while metamodel-based optimization reduced computational requirements. These results demonstrate that tailoring internal flow directionality can significantly enhance ALD process performance.