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<p>Yttrium offers exceptional intrinsic extreme ultraviolet (EUV) transmittance and emissivity for next-generation pellicles. However, its severe oxidation susceptibility limits its practical implementation. In this study, we demonstrate that amorphous carbon (<i>a</i>-C) capping layers effectively preserve metallic Y, whereas plasma-enhanced atomic-layer-deposited SiN<sub>x</sub> causes catastrophic oxidation. Our standalone <i>a</i>-C/Y/<i>a</i>-C film achieves 86.8% EUV transmittance and exhibits remarkable thermal stability, maintaining ≈ 400 ℃ peak temperature for over 1000 cycles under 1&#xa0;W/cm² absorbed power. Transmission electron microscopy analysis of the freestanding membrane revealed substantial fluorine penetration throughout the Y core during back-etching, driven by a strong Y–F thermodynamic affinity. Despite the compositional change, the film retained its robust thermal performance. These results establish <i>a</i>-C–capped Y as a viable high-powered EUV pellicle, demonstrating that strategic material design can overcome intrinsic oxidation challenges while delivering the optical and thermal properties required for advanced lithography.</p> Graphical Abstract <p></p>

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Development of Extreme Ultraviolet Pellicles Based on Yttrium Core with Amorphous Carbon Capping Layer

  • 期刊论文

  • 发表日期：

    2026年1月20日

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  • Kihun Seong,
  • Hye-Young Kim,
  • Yongkyung Kim,
  • Hyeongkeun Kim,
  • Won Jin Kim,
  • Seungchan Moon,
  • Jinho Ahn,
  • Seul-Gi Kim,
  • Hyun-Mi Kim

摘要

Yttrium offers exceptional intrinsic extreme ultraviolet (EUV) transmittance and emissivity for next-generation pellicles. However, its severe oxidation susceptibility limits its practical implementation. In this study, we demonstrate that amorphous carbon (a-C) capping layers effectively preserve metallic Y, whereas plasma-enhanced atomic-layer-deposited SiNx causes catastrophic oxidation. Our standalone a-C/Y/a-C film achieves 86.8% EUV transmittance and exhibits remarkable thermal stability, maintaining ≈ 400 ℃ peak temperature for over 1000 cycles under 1 W/cm² absorbed power. Transmission electron microscopy analysis of the freestanding membrane revealed substantial fluorine penetration throughout the Y core during back-etching, driven by a strong Y–F thermodynamic affinity. Despite the compositional change, the film retained its robust thermal performance. These results establish a-C–capped Y as a viable high-powered EUV pellicle, demonstrating that strategic material design can overcome intrinsic oxidation challenges while delivering the optical and thermal properties required for advanced lithography.

Graphical Abstract