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<p>Three-dimensional (3D) curved micro/nanostructures offer unique optical and mechanical functionalities, enabling applications in microlenses, anti-reflective coatings, and photonic devices. To overcome the limitations of conventional lithography in achieving high curvature, uniformity, and scalability, the Isolated Air-pocket Lithography (IAL) technique has been proposed as an innovative approach. However, previously reported IAL methods, operating as early-stage process models, have been limited to producing spherical structures with diameters in the tens of micrometers. In this study, we present an improved IAL process for large-area fabrication of high-curvature concave microstructures with precisely controlled geometries and feature sizes down to a few micrometers. By systematically tuning the processing temperature and the viscosity of polydimethylsiloxane (PDMS), we established the critical balance between bubble expansion and polymer curing that determines the final pattern morphology. Compared with the original IAL process, the improved method achieves a tenfold reduction in minimum feature size (from 50 to 5&#xa0;μm), short processing time (~ 5&#xa0;min), and excellent structural fidelity. This versatile and cost-effective approach enables scalable production of functional microstructured surfaces for applications in optics, photonics, and sensing technologies.</p> Graphical abstract <p>The improved IAL process enables large-area fabrication of highly curvature concave microstructures with precisely controlled geometries and microstructure sizes on the order of micrometers. Systematic control of the process temperature and viscosity of polydimethylsiloxane (PDMS) establishes a critical balance between bubble expansion and polymer curing, which in turn determines the final pattern shape.</p>

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Isolated air-pocket lithography enabled by balanced bubble expansion and PDMS viscosity for high-resolution three-dimensional curved micropatterns

  • 期刊论文

  • 发表日期：

    2025年11月20日

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  • Sang-Ah Oh,
  • Hwan-Jin Jeon

摘要

Three-dimensional (3D) curved micro/nanostructures offer unique optical and mechanical functionalities, enabling applications in microlenses, anti-reflective coatings, and photonic devices. To overcome the limitations of conventional lithography in achieving high curvature, uniformity, and scalability, the Isolated Air-pocket Lithography (IAL) technique has been proposed as an innovative approach. However, previously reported IAL methods, operating as early-stage process models, have been limited to producing spherical structures with diameters in the tens of micrometers. In this study, we present an improved IAL process for large-area fabrication of high-curvature concave microstructures with precisely controlled geometries and feature sizes down to a few micrometers. By systematically tuning the processing temperature and the viscosity of polydimethylsiloxane (PDMS), we established the critical balance between bubble expansion and polymer curing that determines the final pattern morphology. Compared with the original IAL process, the improved method achieves a tenfold reduction in minimum feature size (from 50 to 5 μm), short processing time (~ 5 min), and excellent structural fidelity. This versatile and cost-effective approach enables scalable production of functional microstructured surfaces for applications in optics, photonics, and sensing technologies.

Graphical abstract

The improved IAL process enables large-area fabrication of highly curvature concave microstructures with precisely controlled geometries and microstructure sizes on the order of micrometers. Systematic control of the process temperature and viscosity of polydimethylsiloxane (PDMS) establishes a critical balance between bubble expansion and polymer curing, which in turn determines the final pattern shape.