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<p>The present study demonstrates a significant advancement in solar water oxidation efficiency and stability by employing a modified electroless deposition of nickel (Ni) on silicon (Si) photoanodes. Utilizing the intrinsic catalytic activity and corrosion resistance of Ni, a conformal and strongly adhered Ni layer (thickness ≈ 500&#xa0;nm after 30&#xa0;min deposition) was synthesized via a solution-based, reducing agent-free process where the Si substrate itself acts as the electron donor for Ni<sup>2+</sup> reduction. Comprehensive surface and interface characterization via SEM, XPS, and XRD confirmed the formation of a porous interfacial SiO₂ layer (~ 400&#xa0;nm) that facilitates enhanced charge transfer and electron conduction across the Ni/Si interface. Photoelectrochemical (PEC) performance under AM 1.5G illumination (100 mW/cm<sup>2</sup>) and 1&#xa0;M KOH electrolyte revealed a maximal photocurrent density of 27.5&#xa0;mA/cm<sup>2</sup> and an onset potential of 1.09&#xa0;V vs. RHE for Ni-patterned Si photoanodes, with the flat-band potential measured as 0.54&#xa0;V vs. RHE via Mott-Schottky analyses as graphically abstracted in Fig.&#xa0;1. Electrochemical impedance spectroscopy demonstrated superior catalytic OER activity with minimized charge-transfer resistance compared to conventional sputtered Ni electrodes. Chronoamperometry validated operational durability, with Ni-coated Si photoanodes maintaining &gt; 75% initial photocurrent for 24&#xa0;h in alkaline media, thus extending feasibility for scalable PEC devices. This modified Ni electroless deposition process on Si offers precise control over film morphology, composition, and adhesion, eliminating toxic reducing agents, and enables scalable fabrication of high-performance Si-based photoanodes for efficient and stable solar fuel production.</p>

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Nickel Electroless Deposition on Silicon Photoanodes: Improved Efficiency and Durability in Solar Water Oxidation

  • 期刊论文

  • 发表日期：

    2026年7月20日

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  • Saravanan B,
  • Natarajan N

摘要

The present study demonstrates a significant advancement in solar water oxidation efficiency and stability by employing a modified electroless deposition of nickel (Ni) on silicon (Si) photoanodes. Utilizing the intrinsic catalytic activity and corrosion resistance of Ni, a conformal and strongly adhered Ni layer (thickness ≈ 500 nm after 30 min deposition) was synthesized via a solution-based, reducing agent-free process where the Si substrate itself acts as the electron donor for Ni2+ reduction. Comprehensive surface and interface characterization via SEM, XPS, and XRD confirmed the formation of a porous interfacial SiO₂ layer (~ 400 nm) that facilitates enhanced charge transfer and electron conduction across the Ni/Si interface. Photoelectrochemical (PEC) performance under AM 1.5G illumination (100 mW/cm2) and 1 M KOH electrolyte revealed a maximal photocurrent density of 27.5 mA/cm2 and an onset potential of 1.09 V vs. RHE for Ni-patterned Si photoanodes, with the flat-band potential measured as 0.54 V vs. RHE via Mott-Schottky analyses as graphically abstracted in Fig. 1. Electrochemical impedance spectroscopy demonstrated superior catalytic OER activity with minimized charge-transfer resistance compared to conventional sputtered Ni electrodes. Chronoamperometry validated operational durability, with Ni-coated Si photoanodes maintaining > 75% initial photocurrent for 24 h in alkaline media, thus extending feasibility for scalable PEC devices. This modified Ni electroless deposition process on Si offers precise control over film morphology, composition, and adhesion, eliminating toxic reducing agents, and enables scalable fabrication of high-performance Si-based photoanodes for efficient and stable solar fuel production.